FLOW RATE ADJUSTMENT MECHANISM, DILUTED CHEMICAL LIQUID SUPPLY MECHANISM, LIQUID TREATMENT APPARATUS, AND OPERATION METHOD FOR THE LIQUID TREATMENT APPARATUS

Japanese Patent JP2015213145

A

PROBLEM TO BE SOLVED: To accurately control a minute flow rate.SOLUTION: In one embodiment, a flow rate adjustment mechanism (208) comprises a first flow rate adjustment device (208A) and a second flow rate adjustment device (208B) which are provided in series in this order from an upstream side in a liquid line (202). When the second flow rate adjustment device is fully opened, the first flow rate adjustment device is adjusted to a prescribed opening degree such that a flow rate of a liquid flowing in the liquid line becomes a prescribed multiple of a preset flow rate. In a state in which the opening degree of the first flow rate adjustment device is adjusted to the prescribed opening degree, the second flow rate adjustment device is adjusted to an opening degree such that the flow rate of the liquid flowing in the liquid line becomes the preset flow rate. In the other embodiment, in a diluted chemical liquid supply mechanism where a chemical liquid flowing in a chemical liquid line (202) is mixed with a dilution liquid flowing in a dilution liquid line (222) at a mixing unit (234) to produce a diluted chemical liquid, the flow rate of the chemical liquid flowing in the chemical liquid line is adjusted by the flow rate adjustment mechanism (208).

AMIYA MICHITAKA
SATO TOSHIZO
EJIMA KAZUYOSHI
NAKAMURA AKIHIRO
TANAKA KOJI
KOSAI KAZUKI

JP2014195361A

November 26, 2015

September 25, 2014

Click for automatic bibliography generation  

TOKYO ELECTRON LTD

H01L21/304; B01D19/00; B01F1/00; B01F3/08; B01F5/00; B01F5/10; B01F15/00; B01F15/04

JP2011176118A	2011-09-08
JP2006278655A	2006-10-12
JP2003120606A	2003-04-23
JP2010232520A	2010-10-14
JP2011125857A	2011-06-30

Hirohito Katsunuma
Hiroyuki Nagai
Hideyuki Mori

Previous Patent: SOLID STATE IMAGING APPARATUS

Next Patent: PERMANENT MAGNET AND VARIABLE MAGNETIC FLUX MOTOR