To provide a flow rate control device capable of examining accuracy in flow rate control of fluid flowing through a channel during operation of semiconductor manufacturing equipment, and the like.

The device is equipped with a control means 8 to output valve drive control information to flow rate control valve mechanism 7 so that the flow rate of a channel 4 becomes the flow rate set value, a flow rate detection means 5 to detect the flow rate of the fluid, and a pressure detection means 6 to detect the pressure of the fluid. The control means 8 is beforehand equipped with the valve characteristic information K in which, when the valve drive control information is outputted to the flow rate control valve mechanism 7, the information indicating relation between the outputted valve drive control information and the flow rate of the channel is stored in association with the pressure of the fluid of the channel. The valve drive control information, as a criteria to be associated with the flow rate set value and the pressure value detected by the pressure detection means 6 during the control of the flow rate is acquired referring to the valve characteristic information K, and the amount of difference between this acquired valve drive control information and the valve drive control information outputted to the flow rate control valve mechanism 7 by the control means 8 is made as the examination information for the flow rate control.