Title:
光学アレイを使用して微細構造を形成するためのフローリソグラフィ技法
Document Type and Number:
Japanese Patent JP6486594
Kind Code:
B2
Abstract:
A continuous flow projection lithography system to form microstructures using an optical array incorporated in a continuous coating process is provided. A mask is placed at a distance from the array. Each element of the array projects one image of the mask onto a substrate, effectively forming an array thereon. A coating process allows flows that can be used to define functional regions of particles or supporting layers that prevent adhesion of crosslinked polymers to surfaces.
More Like This:
| JP2000036457 | EXPOSURE CONTROL METHOD AND ALIGNER THEREOF |
| JP2000323382 | EXPOSURE METHOD |
| JP2000147741 | PHOTOMASK, PRODUCTION OF PHOTOMASK AND PATTERN FORMING METHOD |
Inventors:
Kai Melde
Philip H. Smerchel
Philip H. Smerchel
Application Number:
JP2014032697A
Publication Date:
March 20, 2019
Filing Date:
February 24, 2014
Export Citation:
Assignee:
Palo Alto Research Center Incorporated
International Classes:
G03F7/23; G03F7/207; G03F7/24
Domestic Patent References:
| JP2013033071A | ||||
| JP2006032692A | ||||
| JP2004170628A | ||||
| JP2009049423A |
Foreign References:
| WO2013035489A1 | ||||
| WO2013018699A1 |
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Kato Kazunori