Title:
流体制御装置
Document Type and Number:
Japanese Patent JP6908175
Kind Code:
B2
Abstract:
A fluid control apparatus includes a valve and a pump. The valve has a valve chamber surrounded by the first main plate, the second main plate, and the side plate. The first main plate has a first aperture, and the second main plate has a second aperture. The valve further includes a valve diaphragm disposed inside the valve chamber. The valve diaphragm is configured to switch between a state in which the first aperture and the second aperture communicate with each other and a state in which the first aperture and the second aperture do not communicate with each other. The pump includes a vibration unit that has a piezoelectric device and a vibrating plate. The pump has a pump chamber that is defined by the vibration unit and the second main plate. The pump chamber communicates with the valve chamber through the second aperture.
Inventors:
Shin Tanaka
Daisuke Kondo
Hiroyuki Yokoi
Daisuke Kondo
Hiroyuki Yokoi
Application Number:
JP2020500290A
Publication Date:
July 21, 2021
Filing Date:
December 05, 2018
Export Citation:
Assignee:
MURATA MANUFACTURING CO.,LTD.
International Classes:
F04B45/047; F04B45/04
Domestic Patent References:
| JP2017072140A | ||||
| JP2015117647A |
Foreign References:
| WO2017061349A1 |
Attorney, Agent or Firm:
Kaede International Patent Office