Title:
液体気化システム
Document Type and Number:
Japanese Patent JP5410456
Kind Code:
B2
Abstract:
Provided is a liquid vaporization system capable of promoting vaporization of a liquid material while solving a problem of residual liquid material. A liquid vaporization system has a liquid vaporization apparatus having a pump and a vaporizer. The vaporizer has a case, a heater provided inside the case, a heat storage plate heated by the heater, and a mesh. The mesh is formed by interweaving wires and has an overall flat plate shape. By overlapping the mesh on an upper surface of the heat storage plate, minute irregularities are formed on the heat storage plate by the mesh. A nozzle is provided above the mesh, whereby the liquid material is dropped from the nozzle onto the heat storage plate. The liquid material spreads over the heat storage plate in a thin film and is heated and vaporized on the upper surface of the heat storage plate.
Inventors:
Masayuki Koji
Hiroshi Itato
Hiroshi Itato
Application Number:
JP2011003760A
Publication Date:
February 05, 2014
Filing Date:
January 12, 2011
Export Citation:
Assignee:
CKD Corporation
International Classes:
B01J7/02; B05B7/16; H01L21/027; H01L21/31
Domestic Patent References:
| JP200557193A | ||||
| JP5156448A | ||||
| JP2006352001A | ||||
| JP6232035A | ||||
| JP200938047A |
Attorney, Agent or Firm:
Tsuyoshi Yamada