Title:
FLUIDIZED REACTION METHOD
Document Type and Number:
Japanese Patent JP2535746
Kind Code:
B2
Abstract:
PURPOSE: To improve a fluidity without impairing the characteristics intrinsic to W powder by using CVD reactive gases for depositing HfC by high-temp. CVD and forming the thin film of the HfC on the surface of the W powder at the temp. lower than the temp. of a CVD process.
CONSTITUTION: The W powder is treated at 500 to 800°C lower than the sublimation temp. of the oxide film on the surface of the W powder by using the halogenated gaseous Hf and gaseous hydrocarbon as the CVD reactive gases. The film of the HfC is deposited on the surface of the W powder without impairing the characteristics intrinsic to the W, by which the W powder having the extremely improved flow characteristics is easily produced.
Inventors:
ITAGAKI TAKEHIKO
ARAI TAKASHI
KOBAYASHI TOSHIHARU
ARAI TAKASHI
KOBAYASHI TOSHIHARU
Application Number:
JP41893490A
Publication Date:
September 18, 1996
Filing Date:
December 26, 1990
Export Citation:
Assignee:
KAGAKU GIJUTSUCHO KINZOKU ZAIRYO GIJUTSU KENKYU SHOCHO
International Classes:
C23C16/44; C23C16/32; C23C16/442; (IPC1-7): C23C16/44; C23C16/32