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Patent Searching and Data


Title:
エステル基を有するフッ素化ポリマー、およびマイクロリソグラフィー用フォトレジスト
Document Type and Number:
Japanese Patent JP2005532413
Kind Code:
A
Abstract:
Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of esters derived from fluoroalcohol functional groups that simultaneously impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.

Inventors:
Andrew E. Failing
Gerald Feldman
Frank El. Shadot The Third
Gerry Newton Taylor
Application Number:
JP2003542402A
Publication Date:
October 27, 2005
Filing Date:
October 25, 2002
Export Citation:
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Assignee:
E.I.DU PONT DE NEMOURS AND COMPANY
International Classes:
C08F214/26; C08F232/08; G03F7/004; G03F7/038; G03F7/039; H01L21/027; (IPC1-7): C08F232/08; C08F214/26; G03F7/004; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Yoshikazu Tani
Kazuo Abe