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Title:
FLUORINE-BASED POLYMER THIN FILM AND ITS PRODUCTION METHOD
Document Type and Number:
Japanese Patent JP2008240005
Kind Code:
A
Abstract:

To provide a uniform fluorine-based polymer thin film free from solvent; and to provide a method for producing the same.

The fluorine-containing thin film is formed by vapor-depositing a fluorine-based monomer and a cross-linking agent on the surface of a base material in vacuum. The fluorine-containing thin film can be formed by simultaneously evaporating a fluorine-based monomer and a cross-linking agent and irradiating both or one of the vapors of the monomer and the agent with an electron beam or ultraviolet ray to simultaneously deposit the fluorine-based monomer and the cross-linking agent on the surface of the base material. The fluorine-containing thin film is characterized in that the fluorine-based monomer is cross-linked by a compound having two or three acrylic groups.


Inventors:
USUI HIROAKI
SUNADA KOUKI
NAKAO KENJI
Application Number:
JP2007077969A
Publication Date:
October 09, 2008
Filing Date:
March 23, 2007
Export Citation:
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Assignee:
UNIV TOKYO AGRICULTURE
NIKKEN TOSO KOGYO KK
International Classes:
C23C14/12; C08F20/22; C23C14/48
Attorney, Agent or Firm:
Yoshihisa Nishi