To provide a uniform fluorine-based polymer thin film free from solvent; and to provide a method for producing the same.
The fluorine-containing thin film is formed by vapor-depositing a fluorine-based monomer and a cross-linking agent on the surface of a base material in vacuum. The fluorine-containing thin film can be formed by simultaneously evaporating a fluorine-based monomer and a cross-linking agent and irradiating both or one of the vapors of the monomer and the agent with an electron beam or ultraviolet ray to simultaneously deposit the fluorine-based monomer and the cross-linking agent on the surface of the base material. The fluorine-containing thin film is characterized in that the fluorine-based monomer is cross-linked by a compound having two or three acrylic groups.
SUNADA KOUKI
NAKAO KENJI
NIKKEN TOSO KOGYO KK