Title:
FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER COMPOUND, RESIST COMPOSITION, TOP COAT COMPOSITION AND PATTERN FORMATION METHOD
Document Type and Number:
Japanese Patent JP2014240982
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a resin which is used in a resist composition for pattern formation with an electron ray or a high energy ray at a wavelength of 300 nm or less and in a top coat composition for liquid immersion lithography, and has high water repellency, notably a high receding contact angle.SOLUTION: A fluorine-containing polymer compound has a repeating unit (a) represented by the general formula (2) in the figure and has a mass-average molecular weight of 1,000 to 1,000,000. (In the formula, Rrepresents a polymerizable double bond-containing group; Rrepresents a fluorine atom or a fluorine-containing alkyl group; Rrepresents a substituted or unsubstituted alkyl group or the like; and Wrepresents a single bond, a substituted or unsubstituted methylene group or the like.
Inventors:
MORI KAZUKI
HAGIWARA YUJI
NAGAMORI MASASHI
ISONO YOSHIMI
NARIZUKA SATOSHI
MAEDA KAZUHIKO
HAGIWARA YUJI
NAGAMORI MASASHI
ISONO YOSHIMI
NARIZUKA SATOSHI
MAEDA KAZUHIKO
Application Number:
JP2014178849A
Publication Date:
December 25, 2014
Filing Date:
September 03, 2014
Export Citation:
Assignee:
CENTRAL GLASS CO LTD
International Classes:
G03F7/11; C08F16/24; C08F20/22; C09D127/12; G03F7/004; G03F7/039
Domestic Patent References:
| JP2010204187A | 2010-09-16 | |||
| JPH07117188A | 1995-05-09 |
Attorney, Agent or Firm:
Kiyoshi Yanagii