To provide a monomer for a base resin of a resist material.
A fluorine-containing monomer expressed by formula (1) is disclosed. In formula (1), R1 represents H or a 1-20C monovalent hydrocarbon group, and when R1 is a monovalent hydrocarbon group, a constituent -CH2- may be substituted with -O- or -C(=O)-; R2 represents H, a fluorine atom, a methyl group or a trifluoromethyl group; each of R3 and R4 represents H or a 1-8C monovalent hydrocarbon group, or R3 and R4 may be mutually bonded to form an aliphatic hydrocarbon ring together with the carbon to which both of them are bonded; and A represents a 1-6C bivalent hydrocarbon group. The fluorine-containing monomer is useful as a monomer for manufacturing a base resin of a functional material and a radiation-sensitive resist material. A polymer compound obtained from the monomer is excellent in resolution and water proofing property and extremely effective for precise microprocessing as a base resin of a resist material.
KANOU TAKESHI
KOBAYASHI KATSUHIRO
NISHI TSUNEHIRO
WATANABE TAKESHI
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa