FLUORINE-CONTAINING PHOTOSENSITIVE POLYMER HAVING HYDRATE STRUCTURE AND RESIST COMPOSITION CONTAINING THE SAME

Title:

FLUORINE-CONTAINING PHOTOSENSITIVE POLYMER HAVING HYDRATE STRUCTURE AND RESIST COMPOSITION CONTAINING THE SAME

Document Type and Number:

Japanese Patent JP2003192729

Kind Code:

A

Abstract:

To obtain a fluorine-containing photosensitive polymer having a hydrate structure and a resist composition containing the same.

The photosensitive polymer has a weight average mol.wt. of 3,000-100,000 and comprises repeating units containing at least one group of the following structures (1) and (2). The resist composition containing the above photosensitive polymer is also provided.

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Inventors:

YOON KWANG-SUB
WOO SANG-GYUN
SONG KI-YONG
SANG-JUN CHOI

Application Number:

JP2002368107A

Publication Date:

July 09, 2003

Filing Date:

December 19, 2002

Export Citation:

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Assignee:

SAMSUNG ELECTRONICS CO LTD

International Classes:

C08F12/14; C08F32/04; C08F32/08; C08F212/06; C08F220/10; C08F232/08; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): C08F32/04; C08F12/14; C08F32/08; C08F212/06; C08F220/10; G03F7/039; H01L21/027

Attorney, Agent or Firm:

Mikio Hatta (4 outside)

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