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Title:
FLUORINE-CONTAINING POLYMER HAVING FLUORINE-CONTAINING NORBORNENE DERIVATIVE UNIT
Document Type and Number:
Japanese Patent JP2008308691
Kind Code:
A
Abstract:

To provide a material for a chemically amplifying type photoresist for F2 laser which possesses excellent transparency and improved dry etching resistance.

The material is a fluorine-containing polymer having a ring structure in a polymer main chain represented by the formula (13):-(M1)-(M2)-(N)- (wherein M1 is a structural unit derived from a norbornene derivative having a fluorine-containing alcohol structure; M2 is a structural unit obtained from a 2 or 3C ethylenic monomer which is a fluorine-containing monomer containing at least one fluorine atom; and N is a structural unit derived from a monomer copolymerizable with the structural units M1 and M2). The polymer includes 1-99 mol% of the structural unit M1, 1-99 mol% of the structural unit M2 and 0-98 mol% of the structural unit N and has a number average molecular weight of 500-1,000,000.


Inventors:
Araki, Takayuki
Ishikawa, Takuji
Kume, Takuji
Yamamoto, Akinori
Application Number:
JP2008000172180
Publication Date:
December 25, 2008
Filing Date:
July 01, 2008
Export Citation:
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Assignee:
DAIKIN IND LTD
International Classes:
C08F232/08; C07C33/44; C07C43/313; C07C45/45; C07C49/567; C07C61/28; C07C69/96; G03F7/004; G03F7/038; G03F7/039
Domestic Patent References:
JPS6137825A1986-02-22
JP2002255875A2002-09-11
JP2003020335A2003-01-24
JP2001296662A2001-10-26
JP2001302735A2001-10-31
JP2002201219A2002-07-19
Foreign References:
WO2002036533A12002-05-10
Attorney, Agent or Firm:
朝日奈 宗太