FLUORINE-CONTAINING UNSATURATED CARBOXYLIC ACID ONIUM SALTS

Japanese Patent JP2011173855

A

To provide a photoacid generator for preparing a resist composition forming an excellent pattern shape because of excellent resolution, a wide margin of depth of focus (DOF), a small line edge roughness (LER) and further high sensitivity, and to provide a polymerizable monomer for preparing the photoacid generator in the resist composition composed of a resin having an acid unstable group and functioning as a positive resist, the acid generator and a solvent, etc.

The fluorine-containing unsaturated carboxylic acid onium salt is represented by general formula (1) (wherein, R1 represents polymerizable double bond-containing group; R2 represents fluorine atom or fluorine-containing alkyl; W1 represents bivalent organic group; and Q+ represents sulfonium cation or iodonium cation).

ISONO YOSHIMI
MORI KAZUKI
NARIZUKA SATOSHI

JP2010041165A

September 08, 2011

February 26, 2010

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CENTRAL GLASS CO LTD

C07C69/54; C07C381/12; G03F7/004; G03F7/039; C08F12/14; C08F16/14; C08F20/10; C08F32/00

JP2011180185A	2011-09-15
JP2011195812A	2011-10-06
JP2009122700A	2009-06-04
JP2009074085A	2009-04-09
JP2009019199A	2009-01-29
JP2006308647A	2006-11-09
JP2011180185A	2011-09-15
JP2011195812A	2011-10-06
JP2009122700A	2009-06-04
JP2009074085A	2009-04-09
JP2009019199A	2009-01-29
JP2006308647A	2006-11-09

WO2008056795A1	2008-05-15
WO2010119910A1	2010-10-21
WO2006121096A1	2006-11-16
WO2002073316A1	2002-09-19
WO2008056795A1	2008-05-15
WO2010119910A1	2010-10-21
WO2006121096A1	2006-11-16
WO2002073316A1	2002-09-19

Makoto Koide

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