Title:
フッ素不含複素芳香族光酸発生剤およびそれを含有するフォトレジスト組成物
Document Type and Number:
Japanese Patent JP5357182
Kind Code:
B2
Abstract:
Fluorine-free photoacid generators and photoresist compositions containing fluorine-free photoacid generators are enabled as alternatives to PFOS/PFAS photoacid generator-containing photoresists. The photoacid generators are characterized by the presence of a fluorine-free heteroaromatic sulfonate anionic component. The photoacid generators preferably contain an onium cationic component, more preferably a sulfonium cationic component. The photoresist compositions preferably contain an acid sensitive imaging polymer. The compositions are especially useful for forming material patterns using 193 nm (ArF) imaging radiation.
Inventors:
Ryu, Sen
Varanasi, Pushkan, Earl
Varanasi, Pushkan, Earl
Application Number:
JP2010543177A
Publication Date:
December 04, 2013
Filing Date:
January 13, 2009
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION
International Classes:
G03F7/004; C07C25/02; C07C381/12; C07D333/34; C07D333/42; C09K3/00; G03F7/039
Domestic Patent References:
| JP2008001906A | ||||
| JP2007145804A | ||||
| JP2007507580A |
Attorney, Agent or Firm:
Takeshi Ueno
Tasaichi Tanae
Yoshihiro City
Tasaichi Tanae
Yoshihiro City
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