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Title:
FLUOROPOLYMER AND CHEMICAL-AMPLIFICATION-TYPE RESIST COMPOSITION CONTAINING THE SAME
Document Type and Number:
Japanese Patent JP3761078
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a polymer which contains repeating units derived from perfluoro-2,2-dimethyl-1,3-dioxole; and a chemical-amplification-type resist composition containing the same.
SOLUTION: This resist composition contains (a) a photosensitive polymer comprising (a-1) repeating units represented by the formula and derived from perfluoro-2,2-dimethyl-1,3-dioxole and (a-2) at least one kind of repeating unit selected from the group consisting of repeating units derived from vinyl compounds and repeating units derived from norbornene compounds and (b) a photoacid generator(PAG).


Inventors:
Kim, Hyun-woo
Application Number:
JP2001000326660
Publication Date:
March 29, 2006
Filing Date:
October 24, 2001
Export Citation:
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Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
C08F234/00; C08F210/02; C08F214/06; C08F214/18; C08F216/02; C08F216/14; C08F224/00; C08F232/08; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): C08F234/00; C08F210/02; C08F214/06; C08F214/18; C08F216/02; C08F216/14; C08F232/08; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
JP58038707A
JP58103385A
JP3502585A
JP7233224A
JP10045853A
Attorney, Agent or Firm:
八田 幹雄
野上 敦
奈良 泰男
齋藤 悦子
宇谷 勝幸