Title:
FOCUS MONITORING METHOD, FOCUS MONITOR AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP2003007598
Kind Code:
A
Abstract:
To provide an inexpensive and highly accurate focus monitoring method, focus monitor and method for manufacturing a semiconductor device by eliminating the need for a special photomask.
Focus monitoring is performed by irradiating a photomask 5 with non-telecenric illumination obtained by controlling the shape of an illumination aperture and utilizing such characteristics as the pattern image of the photomask 5 formed by the non-telecenric illumination moves in the direction perpendicular to the optical axis when the focus plane is moved in the direction of the optical axis.
Inventors:
NAKAO SHUJI
MIYAMOTO YUKI
TAMADA NAOHISA
MIYAMOTO YUKI
TAMADA NAOHISA
Application Number:
JP2001191757A
Publication Date:
January 10, 2003
Filing Date:
June 25, 2001
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
G01B11/00; G02B7/04; G02B27/40; G03F7/20; G03F7/207; H01L21/027; (IPC1-7): H01L21/027; G01B11/00; G03F7/207
Attorney, Agent or Firm:
Hisami Fukami (4 outside)