To prevent adhesion of a gasification material onto a gas supply control valve.

This focused ion beam device has a heater 12 within a gas supply control valve 9. When supplying a sublimated gasification material onto a target 3, the gas supply control valve 9 is moved to the opposite target direction to connect a gasification material storage part 6 and a gas inlet pipe 7. When stopping the supply of the gasification material, the gas supply control valve 9 is moved toward the target 3 to shut off the gasification material storage part 6 and the gas inlet pipe 7. In either case, the heater 12 continuously directly heats the valve 9. Accordingly, even if a portion of the sublimated gasification material collides with the valve 9, the heating of the valve 9 prevents adhesion of the sublimated gasification material onto a surface of the valve 9.