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Title:
FOREIGN MATTER DETECTING METHOD, TREATMENT APPARATUS AND FOREIGN MATTER CONTROL SYSTEM
Document Type and Number:
Japanese Patent JP2005043052
Kind Code:
A
Abstract:

To provide a foreign matter detecting method capable of stably detecting floating foreign matter in a treatment chamber by suppressing the deposition of a film caused by plasma treatment and the cloudiness of a measuring window due to etching and capable of enhancing the capturing ratio of foreign matter, and a treatment apparatus.

A foreign matter detector 11 is attached to the measuring window 10 provided in the space between the electrodes of a plasma generator or in the inside of the treatment chamber 1 other than the space, where plasma is formed, above a sample stand and constituted so as to irradiate the inside of the treatment chamber 1 with a laser from the measuring window 10 while scanning the same to detect the scattered light emitted from the foreign matter present in the treatment chamber 1. The foreign matter detector 11 detects the foreign matter on the basis of the detected scattered light during the operation of the treatment apparatus.


Inventors:
ARAI TAKESHI
KAGOSHIMA AKIRA
YAMAMOTO HIDEYUKI
SHIRAISHI DAISUKE
NAKANO HIROYUKI
NAKADA TOSHIHIKO
Application Number:
JP2003199592A
Publication Date:
February 17, 2005
Filing Date:
July 22, 2003
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP
International Classes:
G01L21/30; G01N15/02; H01L21/66; G01N21/956; (IPC1-7): G01N21/956; H01L21/66
Attorney, Agent or Firm:
Yamato Tsutsui