Title:
FOREIGN MATTER REMOVING METHOD AND FOREIGN MATTER REMOVING APPARATUS
Document Type and Number:
Japanese Patent JP2016071092
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a foreign matter removing method and a foreign matter removing apparatus which are capable of removing a foreign matter that exists on a surface of an object more securely and in a shorter time by using an atomic force microscope without requiring an irradiation mechanism of electron beams, ion beams or the like or a large scale facility such as a vacuum chamber.SOLUTION: There is provided a method for removing a foreign matter that exists on a surface of an object by using an atomic force microscope, which uses a probe on the surface of which an adhesive layer having variable adhesiveness depending on temperature is formed, sets the temperature of the probe on which the adhesive layer is formed to temperature at which adhesiveness of the adhesive layer increases, and makes the foreign matter adhere on the adhesive layer formed on the surface of the probe.SELECTED DRAWING: Figure 1
Inventors:
INOMATA HIROYUKI
ABE TAISUKE
ABE YASUTO
ABE TAISUKE
ABE YASUTO
Application Number:
JP2014199487A
Publication Date:
May 09, 2016
Filing Date:
September 29, 2014
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
G03F1/82; G03F1/72; H01L21/304
Attorney, Agent or Firm:
Hiromi Fujimasu
Keiko Fukamachi
Hideo Ito
Naoki Goto
Yusuke Ito
Hideyuki Tateishi
Keiko Fukamachi
Hideo Ito
Naoki Goto
Yusuke Ito
Hideyuki Tateishi
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