Title:
FOREIGN OBJECT ANALYTICAL DEVICE AND METHOD, AND SEMICONDUCTOR MANUFACTURE CONTROL DEVICE AND METHOD
Document Type and Number:
Japanese Patent JP3455306
Kind Code:
B2
Abstract:
PURPOSE: To provide an analytical device capable of quickly analyzing many foreign objects without a professional judgment made by a skilled analyst.
CONSTITUTION: A foreign object analytical device is equipped with a scanning electron microscope(SEM) 2 through which the elemental composition ratio of foreign objects attached to a semiconductor wafer is obtained, a foreign object plot section 10 through which the distribution of foreign objects is obtained for each composition based on the analytical result of the SEM 2, a foreign object classifying section 11 through which the foreign objects are classified on the basis of the distribution of foreign objects, and a foreign object specifying section 12 which specifies the kinds of foreign objects comparing the foreign object classification result with the content of a previously set foreign object data base 13.
Inventors:
Takao Yasue
Application Number:
JP25839994A
Publication Date:
October 14, 2003
Filing Date:
October 24, 1994
Export Citation:
Assignee:
Mitsubishi Electric Corporation
International Classes:
G01N23/223; G01N21/88; G01N21/94; G01N21/956; G01N23/225; H01L21/66; (IPC1-7): H01L21/66; G01N23/223
Domestic Patent References:
| JP5251527A |
Attorney, Agent or Firm:
Soga Doteru (6 people outside)