Title:
FOREIGN SUBSTANCE INSPECTING METHOD AND EXPOSURE SYSTEM
Document Type and Number:
Japanese Patent JP2009071121
Kind Code:
A
Abstract:
To inspect the size of a foreign substance between a reticle and a reticle suction pad surface of an exposure device with high precision as to a foreign substance inspecting method and an exposure system.
Three-dimensional variation amounts of coordinates X, Y, and Z of a photomask 1 on a photomask stage generated owing to entry of the foreign substance into between the photomask 1 and a photomask suction pad surface of the exposure device are converted into two-dimensional variation amounts of coordinates X and Y by using a projection image 3 of a positioning pattern formed on the photomask 1, and the size of the foreign substance is measured in the form of position shift amounts X and Y of the coordinates X and Y.
Inventors:
HOSHI KENJI
Application Number:
JP2007239250A
Publication Date:
April 02, 2009
Filing Date:
September 14, 2007
Export Citation:
Assignee:
FUJITSU MICROELECTRONICS LTD
International Classes:
H01L21/027; G01B11/02; G01B11/30; G01N21/956; G03F7/20
Attorney, Agent or Firm:
Manabe Kiyoshi
Shoji Kashiwaya
Koichi Watanabe
Toshiro Ito
Shoji Kashiwaya
Koichi Watanabe
Toshiro Ito