FORMATION OF CERAMIC COATING FILM, DEVICE THEREFOR AND STRUCTURAL MATERIAL WITH CERAMIC COATING FILM

Title:

FORMATION OF CERAMIC COATING FILM, DEVICE THEREFOR AND STRUCTURAL MATERIAL WITH CERAMIC COATING FILM

Document Type and Number:

Japanese Patent JPH07331442

Kind Code:

A

Abstract:

PURPOSE: To enable film formation on a large-sized member such as a structural material by specifying the total amt. of free substances in a ceramic coating film.

CONSTITUTION: A reactive gas is sprayed from a plasma gun 13 on a substrate 10 on which a film is formed and an underlayer 11 and a ceramic coating film 12 are formed on the substrate 10. At this time, the total amt. of free substances in the ceramic coating film 12 is regulated to ≤200ppm by mol. A carbide ceramic thin film is previously formed on the surface of the substrate and a ceramic coating film having the same compsn. as the ceramic thin film is formed by a thermal plasma CVD method. The carbide ceramic is SiC or TiC. Coating films having the uniform compsn. can be formed even in thermal plasma CVD methods under different conditions.

Inventors:

ANDO YASUTAKA
MEHATA TERU
DOI MASAYUKI
KOJIMA YOSHIYUKI
BABA NOBORU

Application Number:

JP12493694A

Publication Date:

December 19, 1995

Filing Date:

June 07, 1994

Export Citation:

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Assignee:

HITACHI LTD

International Classes:

C23C16/02; C23C16/26; C23C16/32; C23C16/50; (IPC1-7): C23C16/32; C23C16/02; C23C16/26; C23C16/50

Attorney, Agent or Firm:

Ogawa Katsuo

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