Title:
FORMATION OF CIRCUIT PATTERN
Document Type and Number:
Japanese Patent JP2629659
Kind Code:
B2
Abstract:
PURPOSE: To precisely align a mask with respective shot areas on a substrate only by additionally measuring the positional information of marks in the adjacent shot area in a shot area where the positional information of the mark is deteriorated in accuracy and performing mark detection in only a representative shot area.
CONSTITUTION: A mark SYO is shifted by a constant quantity in a y direction on the stage, crossing a spot light and a position y0 at the point of time when the mark SYO and spot light are aligned with each other is detected, further m chips are detected for position in the same manner. When respective measured values of five chips in which four chips C0, C6, C7, and C8 are located at an almost equal distance from the center of a wafer WA along the respective axes of an arrangement coordinate αβ and one chip C3 at the center thereof respectively are detected, if the measured value of one chip greatly differ from its design value, the measured value is ignored and the mark position of a chip adjacent to the chip is measured.
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Inventors:
Toshikazu Madachi
Application Number:
JP10050096A
Publication Date:
July 09, 1997
Filing Date:
April 22, 1996
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20; G03F9/00; H01L21/027; (IPC1-7): H01L21/027; G03F9/00
Domestic Patent References:
| JP60160613A |
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