Title:
FORMATION OF DEPOSITED FILM
Document Type and Number:
Japanese Patent JPS61194714
Kind Code:
A
Abstract:
PURPOSE:To realize a large area of a deposited film containing oxygen while improving its various characteristics, speed of film formation and reproducibility and making quality of the film uniform by a method wherein particular activated seeds which are activated separately beforehand in spaces different from a film forming space are brought into chemical reaction. CONSTITUTION:Instead of creating plasma in a film forming space where a deposited film 10 consisting of an intermediate layer 12 and a photosensitive layer 13 is formed, an activated seed produced by decomposing a compound containing carbon and halogen and an activated seed produced from an oxygen containing compound for film formation coexist in the film forming space. By applying light energy to those seeds, chemical interaction is created or promoted and amplified. The deposited film 10 formed with this method does not get harmful influence from etching, abnormal discharge or the like. Light energy may be applied all over a substrate 11 by a suitable optical system to form the deposited film 10.
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Inventors:
ISHIHARA SHUNICHI
ONO SHIGERU
KANAI MASAHIRO
ODA TOSHIMICHI
SHIMIZU ISAMU
ONO SHIGERU
KANAI MASAHIRO
ODA TOSHIMICHI
SHIMIZU ISAMU
Application Number:
JP3477685A
Publication Date:
August 29, 1986
Filing Date:
February 22, 1985
Export Citation:
Assignee:
CANON KK
International Classes:
C23C16/30; C23C16/22; C23C16/48; G03G5/08; H01L21/205; H01L31/04; (IPC1-7): C23C16/24; G03G5/08; H01L31/04
Attorney, Agent or Firm:
Marushima Giichi