PURPOSE: To form the diamond-like carbon film at a low temp. by using a specific arom. hydrocarbon compd. as a raw material at the time of forming the high-hardness diamond-like carbon film by an ionization film forming method on the surface of a base material for which wear resistance is required.
CONSTITUTION: A substrate 2, such as cutting tool to be treated, is supported by a holder 1 in a vacuum vessel 10 at the time of forming the diamond-like carbon film having the extremely high hardness by the ionization film forming method on the surface of the cutting tool 2 having the high hardness and the excellent wear resistance. A boat 6 contg. the arom. hydrocarbon compd. 5 having ≥128mol.wt., such as naphthalene, is simultaneously heated as a diamond- like carbon source to evaporate the naphthalene 5. The vapor thereof is introduced together with a carrier gas 9 consisting of an inert gas, is introduced into the reaction vessel 10 and is ionized by the thermoelectrons radiated from a hot filament 4. The ions are further accelerated by an acceleration electrode 3 and are brought into collision against the substrate 2 impressed with a bias voltage, by which the extremely hard diamond-like carbon thin film is formed at a low temp.
KAWAGISHI KENJI
ARAI YOSHIHIRO
