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Title:
FORMATION OF FILM
Document Type and Number:
Japanese Patent JPS58185766
Kind Code:
A
Abstract:

PURPOSE: To prevent the deformation of a low m.p. substrate and to obtain a film having good quality in a short time in a method of sticking an evaporating material or the ionized material thereof like a film onto the substrate held by a holder by interposing a specific material between the substrate and the holder.

CONSTITUTION: The inside of a chamber 1 to be evacuated is properly evacuated and the beam from an electron gun 5 is irradiated to the material 4 in a crucible 3. The particles of the material 4 evaporated by said radiation are stuck like a film on the surface of a substrate 9 held by a substrate holder 7 made of metal such as Al having large specific heat. The substrate 9 of a low m.p. such as plastics is mounted to the holder 7 through a material 8 having good heat conductivity and elasticity, for example, a BN-contg. thin sheet. Since the packing 8 has elasticity, no clearance is formed at all between the substrate 9 and the holder 7 when the film sticks to the substrate. Even if the radiation heat from the crucible 3 arrives at the substrate 9, the heat escapes to the holder 7 through the packing 8 on account of the good heat conductivity of the packing 8' and the heating of the substrate 9 does not pipe above the deformation temp. of the substrate 9.


Inventors:
OTANI TADAYOSHI
OGAWA HIROYUKI
WATANABE KANJI
Application Number:
JP6698682A
Publication Date:
October 29, 1983
Filing Date:
April 21, 1982
Export Citation:
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Assignee:
NIPPON ELECTRON OPTICS LAB
International Classes:
C23C14/50; C23C14/32; C23C14/54; (IPC1-7): C23C13/00
Domestic Patent References:
JPS5542049U1980-03-18



 
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