Title:
FORMATION OF NONTRANSPARENT ANODIC OXIDE FILM IN ALUMINIUMMCLAD MATERIAL
Document Type and Number:
Japanese Patent JPS5524947
Kind Code:
A
Abstract:
PURPOSE:To form nontransparent anodic oxide film having beautiful appearance on the Cu-containing Al-alloy side with simple process without necessity for high voltage by the application of a low-voltage electrolytic treatment following an anodic oxidation treatment on a Cu-containing Al alloy-clad material. CONSTITUTION:An Al-clad material consisting of an Al-based alloy in which at least one-side material contains 0.5 to 4.0% Cu is dipped in an oxalic acid electrolytic bath containing 2 to 3% oxalic acid and also provided with a carbon plate or stainless steel as cathode, where the Al-cald material is subjected to an anodic oxidation treatment for 10 to 100 min. at 65 to 90 V. Then, a 5 to 30 min. electrolytic treatment is made by lowering the voltage to 5 to 30 V during electrolysis. Thus, a beautiful nontransparent anodic oxide film is formed on the surface of the Cu-containing Al-based alloy side of Al-clad material.
Inventors:
SHIMAJIRI YOSHIFUMI
Application Number:
JP9713778A
Publication Date:
February 22, 1980
Filing Date:
August 08, 1978
Export Citation:
Assignee:
SHOWA ALUMINIUM CO LTD
International Classes:
C25D11/04; C22C21/00; C22C21/12; C25D11/10; C25D11/12; (IPC1-7): C22C21/12; C25D11/10; C25D11/12
Domestic Patent References:
| JPS52117844A | 1977-10-03 | |||
| JPS52156737A | 1977-12-27 | |||
| JPS52121686A | 1977-10-13 |