PURPOSE: To simply form a pattern of a thin synthetic resin film having satisfactory clearness over the entire surface of a substrate without leaving foreign matter on the surface of the substrate and to facilitate the formation of a multilayered film when the insulating film of a semiconductor device, a passivation film or the dielectric film of a plastic capacitor is formed.
CONSTITUTION: When a thin synthetic resin film is formed on a substrate 3 in vacuum, a mask 10 made of a thin metal sheet or a flexible film having ferromagnetism is stuck to the entire surface of the substrate 3 by attraction to an electromagnet 11 set behind the substrate 3 so as to form a pattern. A thin synthetic resin film having a clear pattern over the entire surface of the substrate can be formed.
KOJIMA JUNJI
SHIMAMOTO MASASHI