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Patent Searching and Data


Title:
FORMATION OF PATTERN OF THIN SYNTHETIC RESIN FILM
Document Type and Number:
Japanese Patent JPH0551729
Kind Code:
A
Abstract:

PURPOSE: To simply form a pattern of a thin synthetic resin film having satisfactory clearness over the entire surface of a substrate without leaving foreign matter on the surface of the substrate and to facilitate the formation of a multilayered film when the insulating film of a semiconductor device, a passivation film or the dielectric film of a plastic capacitor is formed.

CONSTITUTION: When a thin synthetic resin film is formed on a substrate 3 in vacuum, a mask 10 made of a thin metal sheet or a flexible film having ferromagnetism is stuck to the entire surface of the substrate 3 by attraction to an electromagnet 11 set behind the substrate 3 so as to form a pattern. A thin synthetic resin film having a clear pattern over the entire surface of the substrate can be formed.


Inventors:
HAGA MIKIO
KOJIMA JUNJI
SHIMAMOTO MASASHI
Application Number:
JP21067191A
Publication Date:
March 02, 1993
Filing Date:
August 22, 1991
Export Citation:
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Assignee:
MATSUSHITA ELECTRIC IND CO LTD
International Classes:
C08G18/08; C08G18/00; C08G71/02; C23C14/04; C23C14/12; (IPC1-7): C08G18/08; C08G71/02; C23C14/04; C23C14/12
Attorney, Agent or Firm:
Akira Kobiji (2 outside)