PURPOSE: To provide a patterned transparent conductive film formation method by which a patterned transparent conductive film having low resistance and high permeability is formed easily and economically.

CONSTITUTION: A masking ink is applied to a part where a conductive film is unnecessary of a substrate 1, dried, and hardened by heat and light to form a masking pattern 2. A composition for transparent conductive film formation and consisting of a compound at least one of an indium compound and a tin compound and its solvent is applied to the resulting substrate to form a layer 3 of the composition for transparent conductive film formation. By heating the substrate bearing these layers, the masking pattern 2 is thermally decomposed and together with the composition for transparent conductive film formation, it is removed and thus a transparent conductive film is formed on the part, where the masking ink is not applied, of the substrate.