Title:
FORMATION OF RESIST PATTERN
Document Type and Number:
Japanese Patent JPH06177031
Kind Code:
A
Abstract:
PURPOSE: To provide a resist pattern forming method that allows obtaining of the resist pattern in improved dimension accuracy by preventing occurrence of side-etching when a lower-layer resist layer is etched.
CONSTITUTION: Into a lower-layer resist layer 2 formed on a base material 1, oxide formation element ion is implanted by the amount range in which selection ratio, between the lower layer resist layer 2 and an upper layer resist layer 3 formed upon it, is obtained.
Inventors:
KOBAYASHI SHUNICHI
Application Number:
JP32686392A
Publication Date:
June 24, 1994
Filing Date:
December 07, 1992
Export Citation:
Assignee:
KAWASAKI STEEL CO
International Classes:
G03F7/26; G03F7/38; H01L21/027; H01L21/265; H01L21/302; H01L21/3065; (IPC1-7): H01L21/027; G03F7/26; G03F7/38; H01L21/265; H01L21/302
Attorney, Agent or Firm:
Tetsuya Mori (2 others)