FORMATION OF SUPERCONDUCTIVE PATTERN

Japanese Patent JPH02208980

A

PURPOSE:To enable the formation of a superconductive pattern in a simple treating process without using an etching process by a method wherein an organic material film is patterned on a base, a superconductive film is formed thereon, and then the organic material film is removed. CONSTITUTION:A water tank 1 or a monomolecular film forming device used in the Langumuir-Blodgett's technique is used to control a solution composed of solvent such as benzene acetonitrile or the like in which an organic material is dissolved, and the solution is spread in film over the water surface of the water tank 1. The spread film is prevented from freely spreading on the surface of water by separating plates 3 to control a spread area and the aggregative state of the organic material, and a surface pressure corresponding to the formation of film is obtained through the adjustment by moving the position of the separating plates 3, and the surface pressure is set to a specified value, and a clean board 2 is vertically pulled up or down as the surface pressure is kept at a set value, whereby the organic compound high molecular film spread over the water surface is transferred to the surface of the board 2 to obtain a monomolecular film 4 without executing an etching process.

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TANAKA ATSUKO
SHINJO KATSUHIKO
YAMAMOTO KEISUKE

JP2876489A

August 20, 1990

February 09, 1989

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CANON KK

C04B41/87; C01B13/14; C01G1/00; C01G1/12; H01B12/06; H01B13/00; H01L39/24; (IPC1-7): C01B13/14; C01G1/12; C04B41/87; H01B12/06; H01B13/00; H01L39/24

Yoshida Katsuhiro

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