Title:
FORMATION OF THIN FILM
Document Type and Number:
Japanese Patent JPH02101195
Kind Code:
A
Abstract:
PURPOSE:To form a film on a substrate of a large area by a wet process with particles of a water insoluble inorg. material by dispersing the inorg. material in a micelle soln. of a surfactant which is charged by electrolysis to form colloid and by carrying out electrolysis in the micelle soln. to electrolyze the micelle. CONSTITUTION:A surfactant which forms micelle easily because of the low critical micelle concn. and is charged by electrolysis is dissolved to the critical micelle concn. or above to prepare a soln., particles of an inorg. material are dispersed in the soln. and a supporting electrolyte such as NaCl or Na2SO4 is added. Electrodes are then immersed in the soln. and electrolysis is carried out at higher electrolytic potential of the surfactant used. In the case of PEQ having +0.2V oxidation potential to a satd. calomel electrode(SCE), the deposition of the dispersed particles is initiated by impressing >+0.2V potential. The inorg. material incapable of being wet-formed into a film by the conventional technique can be wet-formed into a film.
Inventors:
ONO YOSHIHIRO
MATSUSHIMA FUMIAKI
MATSUSHIMA FUMIAKI
Application Number:
JP25304388A
Publication Date:
April 12, 1990
Filing Date:
October 07, 1988
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
C25D9/04; C25D13/02; (IPC1-7): C25D9/04; C25D13/02
Other References:
JOURNAL OF AMERICAN CHEMICAL SOCIETY
Attorney, Agent or Firm:
Kisaburo Suzuki (1 outside)