Title:
FORMATION OF THIN OXIDE FILM
Document Type and Number:
Japanese Patent JP2000191323
Kind Code:
A
Abstract:
To produce a thin oxide film having a uniform thickness.
When a fluorine capturing agent is added to an aqueous solution containing a fluoro-metallic complex compound and a thin metal oxide film derived from the fluoro-metallic complex compound is deposited on a substrate immersed in the aqueous solution, the deposition of the thin metal oxide film is carried out while continuously, intermittently or temporarily applying sonic waves or ultrasonic waves to the aqueous solution.
Inventors:
CHIYOU KAIKA
Application Number:
JP29745899A
Publication Date:
July 11, 2000
Filing Date:
October 19, 1999
Export Citation:
Assignee:
HOYA CORP
International Classes:
B01F11/02; C01G1/02; C01G23/04; C01G23/053; C23C18/12; (IPC1-7): C01G1/02; C01G23/04; C01G23/053; C23C18/12
Attorney, Agent or Firm:
Toshio Shiozawa (1 person outside)