Title:
FORMING DEVICE AND DEVICE FOR OXIDE THIN FILM WITH, HIGH REFRACTIVE INDEX AND FORMED PRODUCT HAVING HIGH REFRACTIVE INDEX OXIDE THIN FILM
Document Type and Number:
Japanese Patent JP3484452
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a forming device of a oxide with a high refractive index thin film in which a oxide thin film with a high refractive index can be formed on a film forming substrate without forced heating while the impact on the surface by charged particles is suppressed.
SOLUTION: This device is equipped with a first vacuum chamber 2 to produce oxygen plasma of supplied oxygen by high frequency discharge, a metal plate 4 having an orifice 3 which can produce a dominant plasma flow of oxygen plasma against oxygen radicals and which is electrically insulated from the oxygen plasma, and a second vacuum chamber 5 connected with the first vacuum chamber. The second vacuum chamber 5 is equipped with a substrate 7 to be irradiated with the plasma flow dominant against oxygen radicals, and a production source 6A of vaporized particles to vaporize the vapor material of metal or metal oxide and to deposit the vapor particles on the substrate to form a film.
Inventors:
Shoichi Nozoe
Yasumi Yamada
Haruo Uyama
Yasumi Yamada
Haruo Uyama
Application Number:
JP23964899A
Publication Date:
January 06, 2004
Filing Date:
August 26, 1999
Export Citation:
Assignee:
Toppan Printing Co., Ltd.
National Institute of Advanced Industrial Science and Technology
Shoichi Nozoe
National Institute of Advanced Industrial Science and Technology
Shoichi Nozoe
International Classes:
G02B1/11; C23C14/08; G02B1/115; (IPC1-7): C23C14/08; G02B1/11
Domestic Patent References:
| JP5565358A | ||||
| JP4358058A | ||||
| JP860347A |
Attorney, Agent or Firm:
Teruo Akimoto
Teruo Akimoto
Teruo Akimoto
Teruo Akimoto
Teruo Akimoto