PURPOSE: To form a marking pattern having no curve and uniform depth by previously forming the desired marking pattern to a substrate by etching and conducting marking having the same pattern from the upper section of the formed marking pattern by a mechanical method again.
CONSTITUTION: Marking patterns 3 having marking lines 2 in depth and width of 10μm or less, preferably 2-5μm are formed to the whole surface of the substrate 1 of a face for a timepiece at pitches of 20μm or more by photoetching. The depth and width of the mechanically formed marking lines 2 in a post- process reach approximately 2-5μm, an unbalanced state is brought if too large depth and width of etching are produced, and iridescent is displayed at the time of too narrow pitches. Next marking is further conducted in the same direction as the marking lines by a methanical method from the upper sections of the marking patterns 3, thus the obtaining marking patterns 4. Even when the particles of paper are uneven, the marking patterns 4 (marking lines 5) are shaped along the previously formed uniform marking patterns 3 (the marking lines 2), thus keeping uniformity, forming the marking patterns 4 having soft feeling.
IWAMURA MITSUO
WATANABE MASAAKI
