To provide a forming method of a micro-structural body capable of decreasing surface roughness of a side surface of the micro-structural body, the micro-structural body and an optical switch.
At first, a resist layer 16 is formed on an electrically conductive layer 9 formed on a surface of an Si substrate 8 and a cantilever 10. Continuously, the resist layer 16 is patterned by X ray lithography, and a recessed part 17 opened on an upper surface is formed on the substrate 8. Continuously, a metal film 11b of Au is formed on an inner wall surface 17a of the resist layer 16 forming the recessed part 17 by deposition, etc. Thereafter, a mirror base part 11a is formed in the recessed part 17 by plating, etc. and thereafter, the resist layer 16 is removed.
Tatsuya Shioda
Shiro Terasaki
Masatoshi Shibata
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