PURPOSE: To improve precision in alignment and thereby to improve productivity by forming an alignment mark in an alignment region simultaneously in a process wherein a thin-film pattern constructed of a thick insulation film is formed on a thin-film pattern constructed of a conductive film and by providing the alignment mark with a stepped part.

CONSTITUTION: A metal film 10 is deposited on the whole surface of a substrate 1 and subjected to photoetching and thereby an alignment region made up of a thin-film pattern P1, a cross pattern 10a and a square pattern 10b is formed. Next, an insulating film 12 constituted of photosensitive polyimide resin is connected about 10μm thick on the whole surface of the substrate 1 and etched, so as to form marks 12a and 12b simultaneously with a pattern P2. A metal film 14 is evaporated thereafter. According to this constitution, a stepped surface 14a always appears even when a plurality of thin films are laminated on the marks 12a and 12b, and productivity is improved without lowering of precision in alignment.