Title:
Foundation cloth and an adhesion padding cloth
Document Type and Number:
Japanese Patent JP6175767
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a base fabric and an adhesive interlining which can save the trouble of designing weaving and suppress the generation of moire.SOLUTION: The base fabric includes a woven fabric 5 comprising warp 51 and weft 52 to which a relaxation treatment is applied. The woven fabric 5 is weaved by using a first crimped yarn 61 and a second crimped yarn 62 composed of a plurality of filaments for both of the warp 51 and the weft 52. The first crimped yarn 61 and the second crimped yarn 62 are adjacently arranged. The single fiber fineness of the second crimped yarn 62 is 1.3 times or more of the single fiber fineness of the first crimped yarn 61.
Inventors:
Yutoshi Goto
Application Number:
JP2012288096A
Publication Date:
August 09, 2017
Filing Date:
December 28, 2012
Export Citation:
Assignee:
Nitto Boseki Co., Ltd.
International Classes:
D03D15/567; A41D27/06; D03D1/00; D03D13/00; D06M11/00; D06M11/38
Domestic Patent References:
JP9111578A | ||||
JP10060749A | ||||
JP10060748A | ||||
JP3152203A | ||||
JP2010047848A | ||||
JP11158751A | ||||
JP42022594B1 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Yoshinori Shimizu
Yoshiki Kuroki
Yoshinori Shimizu