Title:
土層に石が混在した地質条件での基礎ピット支保方法
Document Type and Number:
Japanese Patent JP7381747
Kind Code:
B2
Abstract:
A method for retaining and protection of foundation excavations under the geological condition of a soil layer containing stones, the method comprising: S1, conducting geological exploration, and determining the position of stones on an excavating path of a foundation excavation; S2, measuring and positioning the boundary of the foundation excavation; S3, a drilling machine handling the stones along a foundation excavation retaining and protection boundary, wherein after the drilling machine firstly drills a plurality of large holes in a soil layer above the stones, protective tubes are inserted into the plurality of large holes respectively, then the drilling machine passes through the protective tubes to drill small holes in the stones, and next, a hydraulic splitting machine is inserted into the small holes, such that the hydraulic splitting machine is used to split the stones to form splits; and S4, performing surface earthwork excavating, installing steel purlins, and driving steel sheet piles. A retaining and protection structure comprises a plurality of insertion plates and connecting plates, wherein clamping slots corresponding to the insertion plates are provided on two sides of each connecting plate. The present invention is used for solving the problem of it not being possible for existing retaining and protection of foundation excavations under the geological condition of a soil layer containing stones to penetrate stones, and a plurality of working faces can be in operation at the same time, thereby shortening a construction period. Moreover, no pollution is caused to the environment.
Inventors:
Zhang Li
Ban Zhongqi
Liying Yang
周 ▲ロン▼
Rei Xiaohong
▲ハオ▼ 相如
Yasushi Kanazawa
Ban Zhongqi
Liying Yang
周 ▲ロン▼
Rei Xiaohong
▲ハオ▼ 相如
Yasushi Kanazawa
Application Number:
JP2022528579A
Publication Date:
November 15, 2023
Filing Date:
August 20, 2021
Export Citation:
Assignee:
China Three Gorges Corporation
International Classes:
E02D17/04; E02D1/02; E02D5/04; E02D5/20
Domestic Patent References:
| JP52155817A | ||||
| JP2000008394A | ||||
| JP9100535A | ||||
| JP62112820A | ||||
| JP7150565A | ||||
| JP2015038278A | ||||
| JP2009057682A |
Foreign References:
| CN101985836A | ||||
| CN109989405A |
Attorney, Agent or Firm:
Patent Attorney Corporation ATEN