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Title:
FREE RADICAL POLYMERIZATION PROCESS
Document Type and Number:
Japanese Patent JP2005320549
Kind Code:
A
Abstract:

To provide a new material which promotes the polymerization of a monomer in a living-type free radical polymerization and to provide a polymerization process using it.

In this process, a mixture comprising at least one monomer, at least one free radical source, and a controlling agent having a thiocarbonyl group is polymerized and a post-treatment such as removing its thio part from the polymer and the like is carried out. The controlling agent is expressed as R1-D-C(=S)-N(R4)NR2R3 (wherein R1 is an alkyl, an aryl which can be substituted or the like; R2, R3 and R4 are H, a hydrocarbyl which can be substituted or the like; D is one of S, Se and Te). By this, a living-type free radical polymerization is enabled for various monomers.


Inventors:
CHARMOT DOMINIQUE
CHANG HAN TING
LI YUNXIAO
HUEFNER PETER
Application Number:
JP2005149799A
Publication Date:
November 17, 2005
Filing Date:
May 23, 2005
Export Citation:
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Assignee:
SYMYX TECHNOLOGIES INC
International Classes:
C07D231/10; C07C337/02; C07C337/04; C07D285/125; C08F2/00; C08F2/38; C08F4/00; C08F4/04; C08F8/00; (IPC1-7): C08F2/38; C08F8/00
Domestic Patent References:
JP2002534499A2002-10-15
Attorney, Agent or Firm:
Kimura Mitsuru