Title:
フルクトース含有非水性マイクロエレクトロニクス洗浄組成物
Document Type and Number:
Japanese Patent JP4272676
Kind Code:
B2
Abstract:
Back end photoresist strippers and residue compositions are provided by non-aqueous compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise a polar organic solvent, a hydroxylated amine, and as a corrosion inhibitor fructose.
Inventors:
Seiji Inaoka
Application Number:
JP2006534481A
Publication Date:
June 03, 2009
Filing Date:
February 01, 2005
Export Citation:
Assignee:
MALLINCKRODT BAKER, INC.
International Classes:
G03F7/42; C11D11/00; H01L21/027; H01L21/304; H01L21/3213
Domestic Patent References:
| JP2000250230A | ||||
| JP2003280219A | ||||
| JP2001343759A |
Attorney, Agent or Firm:
Aoyama Aoi
Mitsutaka Iwasaki
Shoji Nakajima
Mitsutaka Iwasaki
Shoji Nakajima
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