Title:
SPUTTERING DEVICE
Document Type and Number:
Japanese Patent JP3281005
Kind Code:
B2
Abstract:
PURPOSE: To shorten a maintenance time and also to contrive stabilization of film quality of a formed film by enabling maintenance of a target and a susceptor in a state wherein a treatment chamber has been vacuumized.
CONSTITUTION: A target chamber 13 and a suseptor chamber 32 are connected respectively to a first and second opening parts 12, 31 which are provided in a state opposite to a treatment chamber 11. A first and second turnable holders 15, 33 are provided in the respective insides of the target chamber 13 and the susceptor chamber 32. Opening/closing plates 19, 20 of the target chamber side are provided in a plurality of places of the first holder 15. The first opening part 12 is opened and closed by the opening/closing plates via a first driving parts 17, 18 moved backward and forward. Targets 25, 26 are fitted to the opening/closing plates 19, 20 via cathodes 23, 24. Further, opening/closing plates 36, 37 of the susceptor chamber side are provided in a plurality of places of the second holder 33. The second opening part 31 is opened and closed by the opening/closing plates via a second driving parts 34, 35 moved backward and forward. Susceptors 40, 41 are provided in the opening/closing plates 36, 37 of the susceptor chamber side.
Inventors:
Keiichi Hashimoto
Application Number:
JP27689191A
Publication Date:
May 13, 2002
Filing Date:
September 27, 1991
Export Citation:
Assignee:
Oki Electric Industry Co., Ltd.
International Classes:
C23C14/34; C23C14/56; H01L21/205; (IPC1-7): C23C14/56; C23C14/34; H01L21/205
Domestic Patent References:
| JP3158461A | ||||
| JP6326357A | ||||
| JP6360276A | ||||
| JP6480025A | ||||
| JP290665U |
Attorney, Agent or Firm:
Kuninori Funabashi