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Title:
FUMARATE DIESTER-BASED RESIN, AND RETARDATION FILM USING THE SAME
Document Type and Number:
Japanese Patent JP2012140475
Kind Code:
A
Abstract:

To provide a fumarate diester-based resin suitable for a retardation film having high out-of-plane retardation even in a thin film, and excellent optical characteristics such as low wavelength dependency; and to provide a retardation film.

The fumarate diester-based resin includes a diisopropyl fumarate residue unit, a di-tertiary-butyl fumarate residue unit, and a fumarate diester residue unit of a predetermined structural formula. The retardation film uses the resin.


Inventors:
OZAKI SO
FUJII YASUYOSHI
DOI TORU
Application Number:
JP2010291801A
Publication Date:
July 26, 2012
Filing Date:
December 28, 2010
Export Citation:
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Assignee:
TOSOH CORP
International Classes:
C08F22/02; C08J5/18; G02B5/30; G02F1/13363
Domestic Patent References:
JP2002332314A2002-11-22
JP2011021102A2011-02-03
Other References:
JPN6014036754; Takayuiki Otsu, Masahiro Yoshiokam Akikazu Matsumoto, and Kohei Shiraishi: 'Synthesis of high molecular weight poly(dialkyl fumarate)s bearing n-alkyl side chains from poly(di-' Polymer Bulletin Vol.26, No.2, 199107, P.159-164
JPN6014036755; Takayuki Otsu, and Masahiro Yoshioka: 'Radical polymerization and copolymerization of bis{3-[tris(trimethylsiloxy)silyl]propyl}fumarate' Macromolecular Chemistry and Physics Vol.193 No.9, 199209, P.2283-2287
JPN6014036756; Bunichiro Yamada, Eiichiro Yoshikawa, and Takayuki Otsu: 'Observation of steric effect in radical polymerization of dialkyl fumarates by spin trapping with 2,' Polymer Vol.33, No.15, 1992, P.3245-3251



 
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