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Title:
FUNCTIONAL DEVICE, FUNCTIONAL DEVICE MANUFACTURING METHOD, ANALYSIS SYSTEM, AND ANALYSIS METHOD
Document Type and Number:
Japanese Patent JP2016014630
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a novel functional device capable of easily designed, achieving size reduction, and detecting a sample change with high sensitivity, a functional device manufacturing method, an analysis system, and an analysis method using the analysis system.SOLUTION: A functional device of the present invention comprises: a channel in which two or more substrates are joined together and which is formed by a groove formed in one surface of one of the substrates and one surface of the other substrate; and a Mach-Zehnder optical waveguide including at least two optical waveguides and disposed so that the channel overlaps at least one of the optical waveguides in a planar view.

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Inventors:
SHIMIZU HISASHI
MAWATARI KAZUMA
KITAMORI TAKEHIKO
Application Number:
JP2014137772A
Publication Date:
January 28, 2016
Filing Date:
July 03, 2014
Export Citation:
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Assignee:
INST OF MICROCHEMICAL TECHNOLOGY
International Classes:
G01N25/16; G01N21/41; G01N21/45; G01N37/00; G02F1/01
Domestic Patent References:
JP2011107071A2011-06-02
JPH01313736A1989-12-19
JP2009068952A2009-04-02
JP2011214838A2011-10-27
JP2003215140A2003-07-30
Foreign References:
WO2014051054A12014-04-03
Attorney, Agent or Firm:
Masatake Shiga
Yoshifumi Saeki
Yasuhiko Murayama
Kazunori Onami
Makiko Otsuki



 
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