Title:
FUNCTIONAL OXIDE STRUCTURE AND METHOD FOR MANUFACTURING FUNCTIONAL OXIDE STRUCTURE
Document Type and Number:
Japanese Patent JP2009208985
Kind Code:
A
Abstract:
To provide a functional oxide structure having a functional oxide film in (001) single orientation having a tetragonal crystalline structure and a film thickness of not less than 500 nm.
The functional oxide structure 1 has a functional oxide film 30 having a film thickness of not less than 500 nm and a tetragonal crystalline system formed on a substrate 10, wherein the functional oxide film 30 has a crystalline orientation of (001) single orientation.
Inventors:
FUNAKUBO HIROSHI
NAKAGI HIROSHI
FUJISAWA TAKASHI
KAMO TAKASHI
SAKASHITA YUKIO
NAKAGI HIROSHI
FUJISAWA TAKASHI
KAMO TAKASHI
SAKASHITA YUKIO
Application Number:
JP2008052318A
Publication Date:
September 17, 2009
Filing Date:
March 03, 2008
Export Citation:
Assignee:
FUJIFILM CORP
TOKYO INST TECH
TOKYO INST TECH
International Classes:
C30B29/32; C23C14/08; C23C14/54; C23C16/40; C23C16/52; G02F1/03; G02F1/355; H01L21/316; H01L21/8246; H01L27/105; H01L41/08; H01L41/09; H01L41/18; H01L41/22; H01L41/319; H01L41/39
Domestic Patent References:
| JP2007088444A | 2007-04-05 | |||
| JPH10223476A | 1998-08-21 | |||
| JP2004002150A | 2004-01-08 | |||
| JPH0543399A | 1993-02-23 | |||
| JP2002030417A | 2002-01-31 | |||
| JP2009212225A | 2009-09-17 |
Attorney, Agent or Firm:
Yanagita Seiji
Go Sakuma
Go Sakuma