Title:
機能性薄膜、その製造方法、積層構造体及びその製造方法
Document Type and Number:
Japanese Patent JP7292695
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a functional thin film in which a film characteristic such as surface roughness (smoothness), a film strength (hardness), or pulling or compression inside the film (internal stress) is controlled; and to provide a production method thereof.SOLUTION: There is provided a functional thin film having an atomic composition expressed by following general formula (1), and formed by being deposited by pulse sputtering. MM'M"A...(1) (In the formula, M shows a metal element in the periodic table, and M' and M" are each the same or different atom respectively, and show a metal element in the periodic table, Al or C, A shows N, O or C, x shows a number of 0.01-0.75, y shows a number of 0.01-0.75, z shows a number of 0-0.58, n shows a number of 0.24-0.8, and an equation x+y+z+n=1 is satisfied.)SELECTED DRAWING: Figure 1
Inventors:
Tetsuhide Shimizu
Yoshikazu Teranishi
Yoshikazu Teranishi
Application Number:
JP2017156749A
Publication Date:
June 19, 2023
Filing Date:
August 15, 2017
Export Citation:
Assignee:
Tokyo Metropolitan Industrial Technology Research Center
International Classes:
C23C14/06; C01B21/06; C23C14/35; F02F5/00; F16J9/26
Domestic Patent References:
| JP2015199662A | ||||
| JP2015501876A | ||||
| JP2010529295A | ||||
| JP2011516729A |
Foreign References:
| WO2016071104A1 |
Other References:
寺西義一 他,金型への応用を想定したHIPIMS膜の機械的特性評価,東京都立産業技術センタ-研究報告,日本,東京都立産業技術センタ-,2015年,第10号,P76~77
清水徹英 他,HIPIMS法によるTiAlN膜の低温薄膜形成とその膜特性評価,日本機械学会2014年度年次大会講演論文集,日本,日本機械学会,2014年,J2220104
清水徹英 他,HIPIMS法によるTiAlN膜の低温薄膜形成とその膜特性評価,日本機械学会2014年度年次大会講演論文集,日本,日本機械学会,2014年,J2220104
Attorney, Agent or Firm:
Yuichiro Matsuyama
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