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Title:
GAS ANALYZER AND SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2008249537
Kind Code:
A
Abstract:

To provide a gas analyzer capable of precisely measuring the temperature of a sample.

The gas analyzer comprises a measurement chamber 1 having a mounting stand 1a that a substrate W with a sample m absorbed is mounted, a vacuum pump for reducing a pressure in the measurement chamber 1, a halogen lamp 4 for heating the substrate W with the sample m absorbed, a mass spectrometer 8 inserted in the measurement chamber 1 for detecting gaseous molecules of the sample that are desorbed by the increase of a temperature; and temperature measurement systems 11, 16 that measure the temperature of the substrate W using an interferometer 11 that detects the optical thickness of the substrate W. The temperature of the sample m is equal to that of the substrate W. The temperature of the sample m can precisely be obtained by measuring the temperature of the substrate W using the interferometer 11.


Inventors:
Matsudo, Tatsuo
Koshimizu, Chishio
Suzuki, Tomohiro
Abe, Atsushi
Application Number:
JP2007000092192
Publication Date:
October 16, 2008
Filing Date:
March 30, 2007
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
G01N27/62; G01K5/48; G01N25/02; G01N27/62; G01K5/00; G01N25/02