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Title:
ガス分析装置及び基板処理装置
Document Type and Number:
Japanese Patent JP4919860
Kind Code:
B2
Abstract:
A gas analyzing apparatus includes a measurement chamber having a mounting member for mounting thereon a substrate on which a sample is adsorbed; a depressurizing mechanism for depressurizing the inside of the measurement chamber; and a heating unit for heating the substrate having the adsorbed sample thereon and mounted on the mounting member. The apparatus further includes: a mass spectrometer inserted in the measurement chamber, for detecting gas molecules escaping from the sample with an increasing temperature; and a temperature measuring unit for measuring a temperature of the substrate having the adsorbed sample thereon by using an interferometer which detects an optical thickness of the substrate.

Inventors:
Tatsuo Matsudo
Koshimizu ground salt
Tomohiro Suzuki
Atsushi Abe
Application Number:
JP2007092192A
Publication Date:
April 18, 2012
Filing Date:
March 30, 2007
Export Citation:
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Assignee:
東京エレクトロン株式会社
International Classes:
G01N27/62; G01K5/48; G01N25/02
Domestic Patent References:
JP2006112826A
JP2006053042A
JP2005106524A
JP2005098962A
JP2003059915A
JP8306673A
JP64001923A
Foreign References:
WO2006032128A1
Attorney, Agent or Firm:
Masao Tanaka
Toshiyuki Shiojima



 
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