Title:
GAS BARRIER FILM, ITS MANUFACTURING METHOD, AND ORGANIC PHOTOELECTRIC CONVERSION ELEMENT AND ORGANIC ELECTROLUMINESCENT ELEMENT USING THE GAS BARRIER FILM
Document Type and Number:
Japanese Patent JP2016074222
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a gas barrier film having high barrier performance and excellent in bending resistance, smoothness, and cutting processing suitability, and a method for manufacturing the gas barrier film, and to provide an organic photoelectric conversion element and an organic electroluminescent element using the gas barrier film.SOLUTION: A gas barrier film of the present invention has a gas barrier layer formed on at least one surface of a substrate by applying modifying treatment to a coating film of a polysilazane-containing liquid. The gas barrier layer is formed of a film of silicon oxide. In inner areas of two opposite surfaces of the gas barrier layer, the difference Δd(=d-d) between the film density dof the inner area of one surface on the modifying treatment-applied side and the film density dof the inner area of the other surface on the substrate side is 0.1 g/cmor more.SELECTED DRAWING: Figure 1
Inventors:
II HIROMOTO
HONDA MAKOTO
HONDA MAKOTO
Application Number:
JP2015232723A
Publication Date:
May 12, 2016
Filing Date:
November 30, 2015
Export Citation:
Assignee:
KONICA MINOLTA INC
International Classes:
B32B9/00; B05D5/00; B05D7/24; C08J7/04; H01L51/50; H05B33/04
Domestic Patent References:
| JP2009255040A | 2009-11-05 | |||
| JP2006264118A | 2006-10-05 | |||
| JPH1160736A | 1999-03-05 | |||
| JP2009184865A | 2009-08-20 | |||
| JP2009095989A | 2009-05-07 |
Foreign References:
| WO2010024149A1 | 2010-03-04 | |||
| WO2010107018A1 | 2010-09-23 | |||
| WO2010097998A1 | 2010-09-02 |
Other References:
PRAGER ET AL.: "Vacuum-UV Irradiation-Based Formation of Methyl-Si-O-Si Networks from Poly(1,1-Dimethylsilazane-co-1", CHEM. EUR. J., vol. 15, JPN6017005488, 2009, pages 675 - 683, ISSN: 0003502281
HU ET AL.: "A polysilazane coating protecting polyimide from atomic oxygen and vacuum ultraviolet radiation eros", SURFACE & COATINGS TECHNOLOGY, vol. 203, JPN6017005489, 2009, pages 3338 - 3343, XP026191625, ISSN: 0003502282, DOI: 10.1016/j.surfcoat.2009.04.019
松尾英樹ET AL.: "ペルヒドロポリシラザンを用いた高純度シリカ膜の作製とその性質", 第２回ポリマー材料フォーラム講演要旨集, vol. 2nd巻号, JPN6017038078, 1993, pages 317 - 318, ISSN: 0003654027
HU ET AL.: "A polysilazane coating protecting polyimide from atomic oxygen and vacuum ultraviolet radiation eros", SURFACE & COATINGS TECHNOLOGY, vol. 203, JPN6017005489, 2009, pages 3338 - 3343, XP026191625, ISSN: 0003502282, DOI: 10.1016/j.surfcoat.2009.04.019
松尾英樹ET AL.: "ペルヒドロポリシラザンを用いた高純度シリカ膜の作製とその性質", 第２回ポリマー材料フォーラム講演要旨集, vol. 2nd巻号, JPN6017038078, 1993, pages 317 - 318, ISSN: 0003654027
Attorney, Agent or Firm:
Gwangyang International Patent Office