Title:
ガスバリア性フィルムおよびその製造方法
Document Type and Number:
Japanese Patent JP5130615
Kind Code:
B2
Abstract:
To provide a low-cost gas barrier film having high gas barrier properties, and a method of manufacturing the gas barrier film simply and stably.
This gas barrier film has an inorganic compound layer formed on a polymer film, and is characterized in that the ratio of the O atomic concentration to the Al atomic concentration, in the inorganic compound layer, measured by an X-ray photoelectron spectrometry, is 2 to 3 and the C atomic concentration, of the inorganic compound layer, measured by SIMS, is 1×1021to 1×1022atoms/cc. The method for manufacturing the gas barrier film is first to unwind the polymer film, and then, form an inorganic matter layer in an atmosphere of gas plasma containing a carbon element with 0.1 to 10% carbon atomic number to the oxygen atomic number charged during forming the inorganic matter layer, when the inorganic matter layer is formed on the surface of the film by vaporizing a metal.
COPYRIGHT: (C)2007,JPO&INPIT
Inventors:
Yasushi Tateishi
Hirota Kusato
Takashi Arai
Application Number:
JP2005283729A
Publication Date:
January 30, 2013
Filing Date:
September 29, 2005
Assignee:
TORAY INDUSTRIES,INC.
International Classes:
B32B9/00; B32B27/36; C23C14/08
Domestic Patent References:
| JP6210790A | | | | |
| JP2005119260A | | | | |
| JP10249990A | | | | |
